1963 Doubled Die Obverse WDDO-011
ErrorDescription
Identifiable by the now-familiar extra eyelid below the normal eyelid on Lincoln's portrait, the 1963 Lincoln Memorial Cent WDDO-011 carries a set of die markers that includes two geometrically distinctive patterns rarely encountered on other varieties. On the obverse, die scratches form an inverted V above the 3 in the date, and die scratches form an X to the right of the top of the Y in LIBERTY. These geometric scratch patterns are unusual because they suggest intersecting die surface damage from separate events, creating shapes that are visually memorable and easy to recognize once a collector knows what to look for. On the reverse, a strong die gouge runs east-southeast from the rim above the N in UNITED, and a small die gouge can be found below the R in AMERICA. The strong directional gouge from the rim is particularly notable because it indicates forceful contact with the die surface in a specific trajectory, likely from die handling or seating in the press, and its prominence makes it visible even on lightly circulated specimens. Philadelphia struck 754,110,000 business-strike cents in 1963, the second-to-last year before the coin shortage of 1965-67 prompted the temporary elimination of mint marks and the suspension of proof set production. The coin was struck on a 95% copper and 5% zinc planchet, carrying Victor David Brenner's obverse portrait and Frank Gasparro's Lincoln Memorial reverse. For collectors working through 1963 P-mint cents, the inverted V above the 3 and the X near the Y in LIBERTY serve as rapid screening markers before proceeding to confirm the eyelid doubling under higher magnification.
Die Markers
- Obverse: Die scratches form an inverted V above the 3 in the date. Die scratches form an X to the right of the top of the Y in LIBERTY. Reverse: A strong die gouge runs ESE from the rim above the N in UNITED. A small die gouge can be found below the R in AMERICA.
Attribution History
- Discovered by Wexler Team
External References
Community & Reference
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